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Journal Articles

The Nonlinear Diffusion Model of Recrystallization

S. E. Savotchenko, A. N. Cherniakov
Journal: ASME Journal of Heat and Mass Transfer
Publisher: ASME
Article Type: Technical Briefs
J. Heat Mass Transfer. June 2022, 144(6): 064501.
Paper No: HT-21-1667
https://doi.org/10.1115/1.4054121
Published Online: April 5, 2022
View Article titled, The Nonlinear Diffusion Model of Recrystallization
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Topics: Diffusion (Physics), Recrystallization, Grain boundaries
Journal Articles

Heat Transfer and Phase Transformations in Laser Annealing of Thin Si Films

Seung-Jae Moon, Minghong Lee, Costas P. Grigoropoulos
Journal: ASME Journal of Heat and Mass Transfer
Publisher: ASME
Article Type: Review Papers
J. Heat Mass Transfer. April 2002, 124(2): 253–264.
https://doi.org/10.1115/1.1447941
Published Online: November 5, 2001
View Article titled, Heat Transfer and Phase Transformations in Laser Annealing of Thin Si Films
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Topics: Crystallization, Lasers, Nucleation (Physics), Temperature, Melting, Silicon, Excimer lasers, Thin films, Phase transitions, Recrystallization
Journal Articles

A Thermal Instability in the Laser-Driven Melting and Recrystallization of Thin Silicon Films on Glass Substrates

C. P. Grigoropoulos, R. H. Buckholz, G. A. Domoto
Journal: ASME Journal of Heat and Mass Transfer
Publisher: ASME
Article Type: Research Papers
J. Heat Mass Transfer. November 1987, 109(4): 841–847.
https://doi.org/10.1115/1.3248192
Published Online: November 1, 1987
View Article titled, A Thermal Instability in the Laser-Driven Melting and Recrystallization of Thin Silicon Films on Glass Substrates
Open the PDF for A Thermal Instability in the Laser-Driven Melting and Recrystallization of Thin Silicon Films on Glass Substrates in another window
Topics: Glass, Lasers, Melting, Recrystallization, Silicon, Temperature distribution, Heat transfer, Stability, Temperature, Wavelength